Synopsys S-Litho 2024.06 SLitho

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Synopsys S-Litho 2024.06 SLitho

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Synopsys SLitho is a lithography simulation and modeling tool developed by Synopsys , used in the semiconductor industry for advanced photolithography process modeling, optical proximity correction (OPC), source-mask optimization (SMO), and other resolution enhancement techniques (RET).

It plays a critical role in the design-to-silicon flow, especially at advanced process nodes (e.g., 5nm, 4nm, 3nm, and below) where patterning challenges become more complex due to diffraction and other optical effects.

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Overview of Synopsys SLitho

• Full Name : Synopsys Lithography Platform (often abbreviated as SLitho )
• Developer : Synopsys, Inc.
• Product Line : Part of Synopsys’ Silicon Engineering Group
• Use Case : Lithography simulation, OPC, RET development, SMO, lithography hotspot detection
• Integration : Works with other tools like Sentaurus TCAD , IC Validator , and foundry PDKs
  

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Key Features of SLitho

• High-Accuracy Lithography Simulation :
  • Models full optical system including light source, mask, projection lens, and resist stack.
  • Supports both scalar and vector-based electromagnetic simulations.
    
• Optical Proximity Correction (OPC) :
  • Enables model-based OPC to correct for pattern distortions during photolithography.
  • Fast convergence algorithms for large-scale IC layouts.
    
• Source-Mask Optimization (SMO) :
  • Simultaneous optimization of illumination source and mask patterns to improve imaging fidelity.
    
• Process Window Analysis :
  • Evaluates how layout features behave across focus and exposure variations.
    
• Machine Learning Acceleration :
  • Uses ML-based models to speed up simulation and OPC runtimes without sacrificing accuracy.
    
• Integration with Foundry Flows :
  • Used by major foundries (TSMC, Samsung, Intel) for developing and validating lithography models.
    
• Support for EUV and ArF Immersion Lithography :
  • Handles both current and next-generation lithography technologies.
    
  
  

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️ Common Use Cases

Use Case

Description

Model-Based OPC
Corrects layout features to compensate for optical and process distortions

Hotspot Detection
Identifies problematic layout patterns before tape-out

RET Development
Develops and validates resolution enhancement techniques

SMO
Optimizes mask and illumination source together for better imaging

DFM & PV Band Analysis
Analyzes layout robustness across process variations
“S-Litho 2024”:

• “S-Litho” could be a shorthand or internal code name for a lithography-related tool.
• The “2024” suffix likely refers to the 2024 release version, which is common in EDA (Electronic Design Automation) software releases (e.g., 2024.03 or 2024.06).
  

Related Tools from Synopsys:

• Sentaurus Lithography :
  • A full-field lithography simulator used for modeling optical projection systems.
  • Used for OPC, RET development, and process window analysis.
    
• IC Validator :
  • Includes lithography-aware physical verification capabilities.
  • Used for fast lithography hotspot detection without full simulation.
    
• Proteus :
  • An older generation lithography simulation tool, largely succeeded by Sentaurus Lithography.
    
• Solido Variation Designer :
  • Used for variation-aware design, which may integrate with lithography models.
    
  
  

Sentaurus Lithography (S-Litho) 2024Early litho pathfinding, process optimization and analysis

S-Litho represents advanced lithography simulation for semiconductor device manufacturing process development and optimization. It covers a wide range of applications in proximity printing, optical, immersion, extreme ultraviolet (EUV), and electron beam (e-beam) lithography. Process-limiting effects within the imaging system of an exposure tool can be thoroughly analyzed, taking the impact of mask and substrate topography on photoresist patterning into account. Interfacing S-Litho with Synopsys TCAD tools allows a seamless modeling of complex integration techniques such as double-patterning. The link between S-Litho and Synopsys Proteus mask synthesis applications accelerates the generation and validation of optical proximity correction (OPC) models and improves process robustness.